
The fully integrated multi-technique platform of the PHI Genesis offers an array of optional excitation sources, sputter ion sources, and sample treatment and transfer capabilities. These features are essential in studying today’s advanced materials and in supporting your material characterization and problem-solving needs.
PHI Genesis offers high sensitivity and high throughput for large area and small area down to 5 µm and unique high-throughput non-destructive depth profiling using optional hard X-ray Cr source.
The instrument is fully customizable to address all analytical needs.
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Intuitive Sample Navigation And Confident Analysis Area Identification
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The Only Fully Automated High-Throughput Lab-Based Multitechnique XPS/HAXPES Instrument on the Market Commercially Available
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Optimized Depth Profiling
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Superior Micro-Area Analysis
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Bring HAXPES synchrotron capabilities into your lab with the PHI Genesis
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Suite Of Specialized Solutions For In Situ Characterization Of Advanced Materials
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- High-Sensitivity Spectral and Imaging Analysis
- Single Crater Multi-Point Depth Profiling
- Optimized Thin Film Depth Profile Analysis